Facilitation Centre for Industrial Plasma Technologies

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Low energy broad beam ion source.

Low Energy Broad Beam Ion sources are widely used in process industries for surface cleaning, etching, thin film growth and nanopatterning. Ion sources are also used as plasma thrusters in satellites and good for fundamental studies of ion beam physics. But often the ion sources are not very cost effective and simple to use.                                                                                     

Advantages of Low Energy Broad Beam Ion sources

  • Easy to fabricate and require low cost materials.
  • Easy maintenance.
  • Require low cost DC power supplies for operation.
  • Require low vacuum conditions.
  • Gridless broad beam.
  • To monitor the plume divergence and ion energies plasma diagnostics is also developed.


  • Surface cleaning by etching.
  • Surface nanopatterning.
  • Thin film growth by sputtering.
  • Wide beam plume for fundamental studies.


Address for communication:

A-10/B, G.I.D.C. Electronics Estate, Sector 25, Gandhinagar - 382044, Gujarat Ph: +91 79 23269003 Fax: +91 79 23269001

email: fcipt@ipr.res.in


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