Facilitation Centre for Industrial Plasma Technologies

Institute for Plasma Research

Gandhinagar

 

Name             : Dr. Ramkrishna Rane

Qualification :Ph.D(Experimental Plasma Physics)

Designation   : Scientific Officer - F

 

Contact

Phone                : 079 - 23269015

Mobile               : +91 - 9879475123

E-mail ID           : ramu@ipr.res.in, ramkrishna.rane@gmail.com

Current Projects
  • Development of plasma surface engineering technologies for rocket applications
  • Plasma Based PVD reactor development
  • Plasma based PVD coatings on textiles fabric to improve the adhesion between textile and polyurethene.

 

Publications

 

  • "Role of Substrate and deposition condition on the texture evolution of Titanium Nitride thin Film on Bare and Plasma Nitrided High speed Steel"
    P. Saikia, Alphonsa Joseph, R. Rane, B. Saikia, S. Mukherjee, Journal of Theoretical and Applied Physics, 7(1) (2013) 66

  • "Compositional Control of Co-deposited TiAl Film using Dual Magnetron System" R. Rane , M. Ranjan , P. Joshi, S. Mukherjee, Journal of Material Science and Surface Engineering 1(1) (2013) 28.

  • "Role of Substrate and deposition condition on the texture evolution of Titanium Nitride thin Film on Bare and Plasma Nitrided High speed Steel"
    P. Saikia, Alphonsa Joseph, R. Rane, B. Saikia, S. Mukherjee, Journal of Theoretical and Applied Physics, 7(1) (2013) 66

  • "ZnO Thin Film deposition for TCO Application in Solar Cell" S. Agrawal, R. Rane, S. Mukherjee Conference Paper in Energy (2013) 718692.

  • "Preparation and characterisation of Antimony doped Tin Oxide Thin Film synthesised by co-evaporation of Sn and Sb using plasma assisted Thermal Evaporation" C. Jariwala, M. Dhivya, R. Rane, N. Chauhan, P.A. Rayjada, P. M. Raole, P.I. John Journal of nano-Electron.Phys.5 (2) (2013) 02029.