Facilitation Centre for Industrial Plasma Technologies

Institute for Plasma Research

Gandhinagar

Name             : Chetan Jariwala

Qualification : M.Sc (Applied Physics)

Designation   : Scientist - SD

Contact

Phone                : 079 - 23269048, 23269021

Mobile               : +91 - 9374002770

E-mail ID           : chetan@ipr.res.in, chetanjari@yahoo.com

Current Projects

• Optimization of process and plasma parameters for high deposition rate of Si:H thin films by VHF PECVD

Publications

• "Langmuir probe diagnostics of a multi-hole cathode vary high frequency (55 MHz) plasma for deposition for Si:H thin films"  C. Jariwala, P. Vasu, A. Chainani, V. Dalal, and P.I. John in proceeding of the 18th International Photovoltaic Science and Engineering conference (ISPC-18), (2009).

• "Low power density multihole cathode very-high-frequency plasma for mixed phase Si:H thin films" C. Jariwala, A. Chainani, R. Eguchi, M. Matsunami, S. Shin, S. Bhatt, V. Dalal and P.I. John, Applied Physics Letters 93, 191502 (2008).

• "Hydrogenated Silicon Thin Films grown by Multi-hole-cathode Very High Frequency-Plasma Enhanced Chemical Vapour Deposition" C. Jariwala, A. Chainani, S. Bhatt, R Eguchi, M. Matsunami, S. Shin, R. Rane, K. R. Murali, Girish M. Gouda,  V. Dalal, and P.I. John in proceeding of 6th Conference of Asia Plasma & Fusion Association (APFA), (2007).

• "Electronics structure, microstructure and crystal structure of the precipitation-hardened alloy Cu₉₈ Be_1.8 Co_0.2" N. Chauhan, C. Jariwala, P.M. Raole, J. Alphonsa, G. Jhala, A. Chainani, and P.I. John, PRB, 71, 104202 (2005).

• "Structural and magnetic properties of Fe/Ni multilayers" R. Gupta, M. Gupta, A. Chainani,  C. Jariwala, A. Gupta and S. M. Chaudhari, Physica status solidi (c), Vol. 1, Issue 2, 3651-3655 (2004).