Plasma Assisted Chemical Vapour Deposition is employed to deposit hard and colorful coatings at low temperatures. Active species are created when the vapours of organic and organometallic compounds are introduced in the plasma.  These active species interact with the surface of the substrate,  which results in the deposition of a coating.  The properties of the coating can be tailored by varying process parameters like substrate temperature,  power density,  pressure,  diluting gas,  etc.  Different colors are achieved by changing the composition of metals and non-metals in the coating.  Work has been initiated to develop hard coatings like Ti(O,C,N),  TiO-2,  Si(C,N),  ZrO2,  etc.  These coatings are being developed for various substrates like tools,  optical components, artificial jewelry,  high temperature electronics,  Automotive components,  etc.